-
ISO 22519
:
2019
Purifiedwater and water for injection
pretreatment and production
systems
ISO
22519
:
2019
纯化水和注射用水预处理和生产系统
1 Scope
范围
2
N
ormative
references
引用标准
3 Terms,
definitions andabbreviated terms
术语、定义和缩写术语
4
Design and practices
设计和规范
4.1 Setting
system boundaries
确定系统边界
4.1.1
A
PW/
WFI
Pretreatment
and
Production
system
starts
at
thevalve
(inclusive)
before the first supplied water filter
component/ MMF.
PW/WFI
预处理和生产系统的系统边界开始于第一个供水过滤器组件
/
多介质过滤器之前
的阀门
(
包括阀门
)
。
4.1.2
APW
/
WFI
Pretreatment
and
Produ
ct
i
o
n
system
end
boundary
is
at
the
inl
et
valv
e
(inclu
sive)
of
the
PW
j
WFI
storag
e
t
ank
or
at
t
h
e
POU
i
f
a
tank
is
not
in
s
talled.
PW/WFI
预处理和生产系统的系统边界末端位于
PW/WFI
储罐的进水阀
(
包括
)
处,如未安
装储罐,则位于使用端。
4
.
1.3
The
P
W/WFI
st
oragetank
should
not
be
included
in
the
p>
PW
/WF
IPretreannent
and
Pro
duction.
PW/WFI
储罐不应包含在
PW/WFI
预处理和生产系统中。
4.1.4
I
ndustrial
treatment
systems
u
pstream
to
the
PW
/W
FI
Pr
et
r
e
atment
and
Production.
Includ
ing
su
pplyto
other
plant
utiliti
es
e.g.
st
eam
boilers,
potable
water
u
s
age
,
fe
e
d
to
coo
ling
towers
etc.
shou
l
d not
be
i
ncludedin
the PW
/
WFI
Pretreatment
a
nd
Production.
PW/WFI
预处理和生产上游的
工业
处理系统。
包括向工厂其他公用设施的供应,
如蒸
汽锅
炉、饮用水使用、冷却塔进水等,不应包括在
PW/WFI
预处理和生产系统中。
4.2 General
system requirements
系统一般要求
4.2.1
A
bu
il
d
clean
co
n
cept
shall
be
employed
duringthe
in
s
t
allat
i
on
of
PW
/WF
I
Pretreatment
a
ndP
roduction
sys
t
ems:
supp
ly
of
piping
/
tubing
an
d
e
qui
pmen
t
i
n clean
co
ndition
an
d
ins
tallation
method
s
th
at
preven
t
in
gress
of
contaminants.
?
?
?
?
?
?
在安装
PW/WFI
预处理和生产系
统时,应采用
洁净施工
概念:提供洁净条件下的管道和
设备,以及防止污染物进入的安装方法。
4.2
.
2
In
comi
n
g
feed
water
sh
all
m
ee
t
lo
c
al
stan
dard
s
or
WHO
st
and
ards
for
pota
b
le
water.
Ifthi
s
is
n
ot
the
case
,
ad
d
i
tion
al
systems
s
hall
b
e
in
s
ta
ll
e
d
to
im
p
rove
the
water
fe
e
d
parameters
before
the
PW
/W
FIPretreatment
an
d
Production.
原水应符合
当地标准或世卫组织饮用水标准。
否则,
则应安装额外的系统,
以改善
PW/WFI
预处理和生产系统
前端的进水参数。
4
.
2
.3
Th
e
PW
/W
FI
Pr
et
r
eatment
and
Produ
ctio
n
water
qua
li
ty
s
h
a
ll
s
h
ow
improvement
in
all
quality
param
eters
as
th
e
water
a
dv
< br>a
n
ces
throu
gh
th
e
syste
m.
越往
PW/WFI
预处理和生产系统的后续阶段,水的所有质量参数应越好。
4.2.4
The
followin
g
p
arame
ter
s
s
hall be
s
teadily
redu
ce
d at
each
stage
i
n
th
e
sys
tem:
在
系统每个阶段,应稳步减少以下参数
:
microbia
l
tot
al
count;
微生物总数
co
nducti
v
ity
and;
电导率
TOC
TOC
4.2.5
PW
/
WFI
qua
li
ty
p>
s
h
a
llbe
accord
i
ng
to
the la
st re
vi
sio
n
of
the
local/na
tion
a
l/re
le
va
nt
Pharma
co
po
ei
a. Table
1
provid
es
recommen
d
ed
wa
ter qua
li
ty.
PW/ WFI
质量应根据当地
/<
/p>
国家
/
相关药典的最新修订版本进行。表
1
提供了建议的水质。
Table
1
-
Recommended water
quality
表
1
——
建议的水质
#
Parameter
参数
Hardness
(PPM
CaCO3)
硬度(
PPM
CaCO3
)
TOC
(ppb)
Endotoxin
(EU/ml)
细菌内毒素(
EU/ml
)
Microbial
total
count
(cfu
/ml)
微生
物总数(
cfu/ml
)
Free
Chlorine
(ppm)
余氯(
ppm
)
Pseuldomonas
(cfu/100
m
l)
假单胞菌
(cfu/100
ml)
RO
feed
RO
进水
≤feed
water
≤
原水
≤feed
water
≤
原水
NA
After
RO
RO
出水
<1
<
500
NA
<1
PW
纯化水
<1
WFI
注射用水
1
2
3
<
500
(online)
<
500
(online)
<
p>
500
(在线)
<
500
(在线)
NA
<
0.25
<
10
cfu/100m
l
<
0.05
4
<
500
<
200
<
100
5
<
0.05
<
0.05
<
0.05
6
<
1
<
1
<
1
<
1
7
E.
coli
(cfu/100
ml)
大肠埃希菌
(cfu/100
ml)
Total
coliforms,
Fungus,
(cfu/100ml)
总大肠菌群,真菌
< br>(cfu/100
ml)
Conductivity
(μS/cm)
电导率
(μS/cm)
<
1
<
1
<
1
<
1
8
<
1
<
1
<
1
<
1
9
Like
feed
wat
er
与原水相同
<10
<
1.3
(online)
p>
<
1.3
(在线)
<
1,3
(online) <
/p>
<
1.3
(在线)
Conductivity
shall
be
measured
uncompensated
at
25
°
C
according
to
USP.
电导率应根据
USP
进行无补偿的测量。
4.2.6
A
sampling
programme
with
acceptance
criteria
shall
gather;
ana
lyse
anddocument
thi
s
water quality improvement.
应制定取样方案并有接受标准;分析和记录水质的改善。
be
in
placeto
4
.
2.7
During
pro
d
uction,
thePW
/W
FI
Pretreatment
an
d
Production
shall
control
the
maxim
um
water
t
emperature
in
the
system.
Durin
g
produ
ctio
n,
themaximum
temperature
of
the
warmestpoint
in
the system shall
be nomore
than
25
°
C
(guidance value).
在生产过程中,
PW/WFI
预处理
和生产系统应控制系统中的最高水温。在生产过程中,系
统中最暖点的最高温度不应超过
25
℃
(
指
导值
)
。
4
.
2.8
Allparts
of
the <
/p>
PW
/WFI
Pretreatment
and
Production
shall
be
hot
water
san
iti
zed,
from
the
feed
water
inl
etvalve
to
the
PW
/W
FI
fill
valve.
During
sanitizat
i
on
,
the
PW
< br>/W
FI
Pretreatment
and
Production
shall
contro
l
thewater
temperature
in
the
system
.
During
sa
nitiz
ation,the
a
ll
the
points
of
the
systems
hould
be
at a minimum of
80
°
C
(
g
u
idance
value).
PW/WFI
预处理和生产系统从进水阀到
PW/WFI
出水阀的所有部件都
应经过热水消毒。在
消毒过程中,
PW/WFI
预处理和生产系统应控制系统中的水温。在消毒期间,系统的所有
点应
≥80
℃
(
指导值<
/p>
)
。
4
.
2.9
ThePW
/W
FI
P
ret
re
atmenta
nd
P
roduction
system
shall
be
designed,
controlled,
regulated,
operated
an
d
maintainedto
ensu
re
that
thefinal
water
quality
re
li
ably
meetsfinal
wa
t
er
quality
sta
ndar
dset
i
n
4.2.5
.
This
performance
shall
be
stable
underall
co
nditi
ons
including
common
worst
case
scenari
os,
cha
nging
seasons
or
other
fluctuating environmental conditions.
PW/WFI
预处理和生产系统应进行设计、控制、规范、操
作和维护
,
以确保最终水质可靠地
满足
4.2.5
中设定的最终水质标准。
此性能在所有情况下应保持稳定
,
包括常见的最坏情况、
p>
季节变化或其他环境条件波动。
4.3 User Requirements Specifications
(URS) scope
用户需求规范
(URS)
的范围
The
scope of the
UserRequirements
Specifications sha
ll
include the
following
:
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
?
用户需求规范的范围包括以下内容:
se
l
ection
ofwater compendial
standard
based
on
products
supplie
d
;
< br>
根据所供应的产品选择水标准
;
p>
s
pecifi
cat
ion
of
thefinal water
stan
dard
parameters;
最终水标准参数的规范
;
safety
and Good
Manufacturing
Pr
actice
requirements
for
the
system;
系统的安全和
GMP
要求
;
list of main components;
主要组件列表
;
p
r
eliminary
sizing o
f
productionflowrate;
生产流速的初步估算
;
number of
product
i
on
units;
生产单元的数量
;
functional requirements;
功能需求
materials
of
construct
ion
;
材质要求
equipment
surface
finish;
设备表面抛光
biological
control
conce
pt
;<
/p>
生物控制要求
high
level
cont
rol:
interlocks
.
alarmsand warnings;
高级控制:互锁、警报和报警
;
documentation required (see
C
l
a
u
s<
/p>
e14);
所需的文件
(
见第
14
条
);
validation as
required by respective authorities
a
nd
;
根据有关机构的要求进行验证
;
Performance Qualification
(PQ)
monitoring
pa
rame
te
r
s.
性能确认
(PQ)
监控参数。
The
scope
of
the
User
Requirements
Speci
fications
shall
include
of
incoming
waterover
all
yearly
seasons,both
chem
i
cal
and
microbiological.
用户需求规范的范围应包
括全年不同季节的原水分析,包括化学和微生物。
4.4 Detailed system
capacity calculation
详细的系统能力计算
analysis
4.4.1
Data
and/or
estimates
of
current
and
futurePW
/WF
I
u
se
shall
be
used
to
size
the
flow
rateof
the
PW
/WF
I
Pretreatment
and
Pr
oduct
i
on
Sys
tem
.
当前和未来
PW/WFI
使用的数据和
/
或估算应用于调整
PW/WFI
预处理和生产系统的流速。
4
,
4
.
2
The
flow
rates
hall
he
analysed
in
conjunctionw
i
th
the
worst-case
consumption
scenario.
Tak
i
nginto
account
PW
/W
FI
storage
tank
size
.
应结合最差条件下的用水情况分析流速。考虑
PW/WFI
储罐大小。
4.4
.
3
A
fu
ll
tabulation
of
all
users,
presentand
future,
s
h
all
be
compiled,
listing
the
quantity
of
P
W/WF
I
required,
per
day,
per
hour
over
a
week
period.
Thedraw
off
flow
shall
be
calculated,from
the
Storageand
Distribution
(S&D),
perhour
of
the
day
and
plot
the
sto
r
age
tank
levels
for
a
full
week.
In
some
cases
l
isting
of
req
uired
PW/WF
I
an
d
take
off
flowcalculations
for
a
period
that
exceeds
one
week
may
benecessary.
In
such cases
the
evaluation period
shallbe extended
according
l
y.
应编制目前和将来所有用户的完整表格,列出一周内每天每小时所需的
P
W/WFI
量。应计
算储存和分配系统
(S&D)
每天每小时的排水量,并绘制整个星期的储罐水平。在某些情况
下,可能需要列出超过一周的
PW/WFI
和排
水量。在这种情况下
,
评价周期应相应延长。
< br>
4
.
4.4
Once
this
information
has
been
summarized,
the
sizing
for
the
PW
/WFI
Pretreatment
andProduction
and
PW
/WFI
storage
tank
may
be
determine
d
.
汇总此信息后,可以确定
PW/WFI
预处理和生产系统以及
PW/WFI
储罐的尺寸。
5
Selecting materials, methods and system
components
选择材料、方法和系统组件
5.1 Recommended system
components/treatment
stages
推荐的系统组件
/
处理阶段
5.1.1
Pretreatment,
ultra
filtration
and
microfiltration-
membranebased
process
for
removal
of
suspend
edso
li
ds,
bacteria
an
d
TOC upstream
of
RO.
预处理、超滤和微滤膜工艺,
可用于去除
RO
上游的悬浮固体、细菌和
TOC
。
NOTEPretreatmentUF is usually operated
w
i
th a
re
j
ect stream and cleaned
with a back
wash.
5.1.2 MMF
-removal
of
coarseparticulates
pre
R
O inthe
range of 30 micron
- 50 micron
cleaned by
backflush
of water to drain.
多介质过滤器
——
在
RO
之前去除
30
微米
-5
0
微米范围内的粗颗粒,通过回水冲洗排出。
5.1.3
F
lu
shedScreen/D
i
sc
F
ilters
(FS/DF)
-
removalof
coarse
particula
te
s
upstreamof
RO
inthe range
of
30
micron
-
50micron.
冲洗滤网
/
p>
圆盘过滤器
(FS/DF)
——
去除
RO
上游
30
微米
- 50
微米范围内的粗颗粒。
5
.1.
4
Chlo
r
ination-
dosageand/or
gene
r
ation
of
hypoc
h
lor
i
tean
d/or
chlo
ri
ne
togenerate
f
r
eechlorine
levels
insystem
with
a
ra
n
ge
of0,2
ppm
-
0
,5
ppm(with
suitable
contac
t
time)
for control
ofincoming
and
system
bacteria
levels.
氯化
——
投入或产生次氯和
/
或氯以使系统余氯水平在
p>
0.2 ppm - 0.5 ppm
的范围内
(
具有适
当接触时间
)
,以控制系统本身和引入的细菌水平。
5.1.5
Chlo
r
ine
d
i
oxide(CD)
-
generationand
dosage
of
ch
l
orinedioxi
d
e
to
a
range
of
0,1ppm
-
0.4
ppm
(with
suitable
contact
time)
for
control
of
incoming and system
bacteria
l
evels.
二氧化氯
(CD)
——
产生和投入二氧化氯以达到
0.1ppm
- <
/p>
0.4ppm(
具有合适的接触时间
)<
/p>
,
以控制系统本身和引入的细菌水平。
5.1.6
Softeners
-
for
replacement
of
magnesium-calcium,
barium
and
strontiumwit
h
so
d
iu
m
to
reducesca
l
e
precipitationon
t
he
R
O
membranes
w
ith
a
recommendeddownstream
10
micron
-20micron
re
s
i
n
trap.
软化剂
< br>——
用于用钠替代镁
-
钙、
p>
钛和钚
,
以减少
RO
膜上的结垢沉淀,
RO
膜下游推
荐
10
微
米
- 20
微米树脂疏水阀。
5.1.7
Antiscalant(AS)
-
additio
n
of
chemicalsto
RO
feedwater
to
defer
hardness
precipi
t
ationon
the
RO membranes.
抗垢剂
(AS)
——
在
RO
进水中添加化学品,以减少
RO
膜上的硬沉淀。
5.1.8
Electric
scale
contro
l
(ESC)
-
resinfree
electrolytic
precipitat
i
on
ofscale
to
sto
p
hardness
p
recipitationon
the
RO
membranes.
Also
used
for
heavy
metal
oxidation
and
removal.
Non
sacrificial
anode
andcathode.
电子除垢仪
(ESC)
——
树脂无电解沉淀的刻度
,
以阻止
RO
膜上的硬
沉淀。
也用于重金属的
氧化和去除。非牺牲阳极和阴极。
5.1.9
Activecarbon
filt
e
r
(ACF)/Granular
Active
Carbon
(GAC)
-
removal
of
oxidize
rs,
chlorine/chloramine,
TOC,
upstream
of
RO
membranes.
活性碳过滤器
(ACF)/
颗粒活性炭
(GAC)
-
去除
RO
膜上游的氧化剂、氯
p>
/
氯胺、
TOC
。
5.1.10
SodiumBi
S
ulfite
(SB
S)
-
(or
other
sulfite
ba
se
d)
chemical
addition
pre
RO
forreduction of
oxid
i
zers, ch
l
orine/chloramine.
硫磷钠
(SBS) - (
或其他基
于亚硫酸盐
)
在
RO
< br>前添加的化学剂,
用于减少氧化剂、
氯
< br>/
氯胺。
5.1.11
SodiumHydroxide
(N
aO
H)
-
addition
of
chem
i
cal
for
pH
co
ntrol
upstream
of
RO
membrane
s
to
contro
l
CO
2
in RO
permeate.
氢氧化钠
(NaOH) -
添加用于控制
RO
膜上游
PH
的化学剂,以控制
RO
渗透中的
CO2
。
5.1.12
Dega
ss
ing
CO2contact
membrane
(degasser)
-
watercontact
membrane
for
reduction
of
CO2
gas
inwater
upstream
of
RO
and
CDI/EDI/CED
I.
Fabricate
degasser
hou
s
ing
from
SS
3
16L
and
the
membrane
will
r
esist
hot
water
sanitizations
o
the
d
egasse
r
will
b
e
ableto
undergo
hot
water
sanitization.
Clean,
dry
,
oil
free
compressed
air
will
sweep
throu
g
h
a
filter
and
into
th
e
membrane
housing
for
C02
removal.
Optionally
if
appropriate
compressed
air
is
not
availab
l
e
,
air
can be
drawn
through
thehousing
by a
vacuum
pump
.
The
outside
air
sha
ll
be
filtered
before being
drawn
through
the
housing.
脱气
CO2
接触膜
< br>(
脱气膜
)-
水接触膜,用于减少
RO
和
CDI/EDI/CEDI
上游水中的
CO2
气
体。由
SS
316L
制造的脱气器外壳和膜可耐受热水消毒,因此脱气器
能够进行热水消毒。
洁净、干燥、无油的压缩空气会通过过滤器进入膜壳体以去除
CO2
。在没有适当的压缩空
气时,可以通过
真空泵吸入空气。通过壳体吸入之前,外部空气应进行过滤。
5.1.13
UltraViolet
(UY)
Lamp
-
irradiation
of
the
water
for
dechlorination
ofchlorine/chloramine,
upstream
of
RO
membranes.
A
UV
lamp
may
also
be
used
formicrobial
load
reduction.
The
feed
water
is
de-chlorinated
by
exposure
toultraviolet
irradiation by
degrading the
free chlorine into
an Oxygen molecule
(O2)and a Chloride
ion. The unit sizing
should reduce a minimum of 0.5 ppm freechlorine to
safe levels of <
0,02 ppm. The unit can
include a UV-MPL (mediumpressure lamp) - with wide
emission
spectrum. The unit housing may
befabricated from SS 316 and the internal parts
from SS
316 or high·
gradeQuartz.
紫外线
(UY)
灯
- RO
膜上游水的辐照进行氯<
/p>
/
氯胺脱氯。
紫外线灯也可用于降低微生
物负荷。
紫
外
线
灯
通
过
将
游
离
氯
降
解
p>
成
氧
分
子
(O2)
和
氯
气
,
使
原
水
脱
氯
。
装
置
能
力
应
至
少
将
0.5ppm
的
游
离
氯
降
至
安
全
< br>水
平
±
0.02
ppm
。
该
装
置
可
包括
一
个
具
有
宽
< br>发
射
光
谱
的
UV-MPL(
中压灯
)
。
装置外壳可能由
SS 316
制造,
内部部件可能由
SS 316
或高等级石英。
紫外线等应可以进行热水消毒。
5.1.14
Sing
l
e
PassRever
se
Osmosis
(S
PRO)
-
membrane
ba
se
dproce
ss
for
reductionof:
ion
s
,
TO
C,
bacteria and endotoxin.
A
l
ways
operated
with
a
rejectstream.
单通反渗透
(SPRO) -
基于膜
的工艺以去除离子、
TOC
、细菌和内毒素。始终使用拒绝流运
行。
5.1.15
Double
Pa
ss
Reverse
Osmosis
(DPRO)
-
membranebased
process
for
reduction
of:
ions,TOC,
bacte
r
ia and endotoxin.
The
firstpass permeate is
the feed to the
second
pass.
Alwaysoperated with a rejec
t
stream.
双通反渗透
(DPRO)
——
基于膜的工艺以去除离子、
p>
TOC
、细菌和内毒素。第一个渗透串
联到
第二个。始终使用拒绝流运行。
5.1.16
Continuous
Electro
De-
I
onization(CDI/EDI/CEDI)
-
for
reduction
of
water
ion
levels
downstream of
RO
usin
g
electrically
regenerated
re
sin.
连续电除盐
(CDI/EDI/CEDI) -
使用电再生树脂降低
RO
下游的水电水平。
5.1.17
Polishing
Ultra
filtration
-
is
a
membrane
basedprocess
using
molecular
weight
cut
off
6
000
or
smaller
forreduction
of
endotox
in,
TOC
andbacteria
or
post
C
DI/EDI/CEDI.
精制超过滤
-
基于膜的工艺,使用分子量小于
6000
或更少,以减少内毒素
,TOC
和细
菌或
用于
CDI/EDI/CEDI
之
后
.
5.2 Advantages and
disadvantages
ofsystem
components/treatment stages
系统组件
/
处理阶段的优缺点
5.3
Materials
ofconstruction
–
General
构造材料
——
一般要求
5.3.1
All
com
p
onentsin
the
PW
/W
FIPretreatm
ent
and
Produ
ctionsystem
shall
be
manufactured
from
S
t
ainless
Steel
(55)
3
1
6/3
16L.
All
PW/WF
I
co
< br>n
tact
part
s
-
-
-
-
-
-
-
-
-
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