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作者:高考题库网
来源:https://www.bjmy2z.cn/gaokao
2021-02-28 05:15
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2021年2月28日发(作者:doggone)


硅片行业术语大全


(


中英文对照



I-Z)




Ingot - A cylindrical solid made of polycrystalline or single crystal silicon from which wafers are


cut.



晶锭



-


由多晶或单晶形成的圆柱体,晶圆片由此切割而成。




Laser Light-Scattering Event - A signal pulse that locates surface imperfections on a wafer.



激光散射



-


由晶圆片表面缺陷引起的脉冲信号。




Lay - The main direction of surface texture on a wafer.





-


晶圆片表面结构的主要方向。




Light Point Defect (LPD) (Not preferred; see localized light-scatterer)



光点缺陷


(LPD)


(不推荐使用,参见



局部光散射

< br>”





Lithography - The process used to transfer patterns onto wafers.



光刻



-


从掩膜到圆片转移的过程。




Localized Light-Scatterer - One feature on the surface of a wafer, such as a pit or a scratch that


scatters light. It is also called a light point defect.



局部光散射



-

晶圆片表面特征,例如小坑或擦伤导致光线散射,也称为光点缺陷。




Lot - Wafers of similar sizes and characteristics placed together in a shipment.



批次



-


具有相似尺寸和特性的晶圆片一并放置在一个载片器内。




Majority Carrier - A carrier, either a hole or an electron that is dominant in a specific region, such


as electrons in an N-Type area.



多数载流子



-

一种载流子,在半导体材料中起支配作用的空穴或电子,例如在


N

< br>型中是电


子。




Mechanical Test Wafer - A silicon wafer used for testing purposes.



机械测试晶圆片



-


用于测试的晶圆片。




Microroughness - Surface roughness with spacing between the impurities with a measurement of


less than 100 μm.



微粗糙



-


小于


100


微米的表面粗糙部分。




Miller Indices, of a Crystallographic Plane - A system that utilizes three numbers to identify plan


orientation in a crystal.



Miller


索指数



-


三个整数,用于确定某个并行面。这些整数是来自相同系统 的基本向量。




Minimal Conditions or Dimensions - The allowable conditions for determining whether or not a


wafer is considered acceptable.



最小条件或方向



-


确定晶圆片是否合格的允许条件。



Minority Carrier - A carrier, either a hole or an electron that is not dominant in a specific region,




such as electrons in a P-Type area.



少数载流子



-


在半导体材料中不起支配作用的移动电荷,在


P


型中是电子,在


N


型中是 空


穴。




Mound - A raised defect on the surface of a wafer measuring more than 0.25 mm.



堆垛



-


晶圆片表面超过


0.25


毫米的缺陷。




Notch - An indent on the edge of a wafer used for orientation purposes.



凹槽



-


晶圆片边缘上用于晶向定位的小凹槽。




Orange Peel - A roughened surface that is visible to the unaided eye.



桔皮



-


可以用肉眼看到的粗糙表面




Orthogonal Misorientation -



直角定向误差



-



Particle - A small piece of material found on a wafer that is not connected with it.



颗粒



-


晶圆片上的细小物质。




Particle Counting - Wafers that are used to test tools for particle contamination.



颗粒计算



-


用来测试晶圆片颗粒污染的测试工具。




Particulate Contamination - Particles found on the surface of a wafer. They appear as bright points


when a collineated light is shined on the wafer.



颗粒污染



-


晶圆片表面的颗粒。




Pit - A non-removable imperfection found on the surface of a wafer.



深坑



-


一种晶圆片表面无法消除的缺陷。




Point Defect - A crystal defect that is an impurity, such as a lattice vacancy or an interstitial atom.



点缺陷



-


不纯净的晶缺陷,例如格子空缺或原子空隙。




Preferential Etch -



优先蚀刻



-



Premium Wafer - A wafer that can be used for particle counting, measuring pattern resolution in


the


photolithography


process,


and


metal


contamination


monitoring.


This


wafer


has


very


strict


specifications for a specific usage, but looser specifications than the prime wafer.



测试晶圆片



-


影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶 圆片。对于具体


应用该晶圆片有严格的要求,但是要比主晶圆片要求宽松些。

< p>



Primary Orientation Flat - The longest flat found on the wafer.



主定位边



-


晶圆片上最长的定位边。




Process Test Wafer - A wafer that can be used for processes as well as area cleanliness.



加工测试晶圆片



-


用于区域清洁过程中的晶圆片。




Profilometer - A tool that is used for measuring surface topography.



表面形貌剂



-


一种用来测量晶圆片表面形貌的工具。




Resistivity (Electrical) - The amount of difficulty that charged carriers have in moving throughout




material.



电阻率(电学方面)



-


材料反抗或对抗电荷在其中通过的一种物理特性。




Required - The minimum specifications needed by the customer when ordering wafers.



必需



-


订购晶圆片时客户必须达到的最小规格。



Roughness - The texture found on the surface of the wafer that is spaced very closely together.



粗糙度



-


晶圆片表面间隙很小的纹理。




Saw Marks - Surface irregularities



锯痕



-


表面不规则。




Scan Direction - In the flatness calculation, the direction of the subsites.



扫描方向



-


平整度测量中,局部平面的方向。




Scanner Site Flatness -



局部平整度扫描仪



-



Scratch - A mark that is found on the wafer surface.



擦伤



-


晶圆片表面的痕迹。




Secondary Flat - A flat that is smaller than the primary orientation flat. The position of this flat


determines what type the wafer is, and also the orientation of the wafer.



第二定位边



-


比主定位边小的定位边,它的位置决定了晶圆片的类型和晶向。




Shape -



形状



-



Site - An area on the front surface of the wafer that has sides parallel and perpendicular to the


primary orientation flat. (This area is rectangular in shape)



局部表面



-


晶圆片前面上平行或垂直于主定位边方向的区域。




Site Array - a neighboring set of sites



局部表面系列



-


一系列的相关局部表面。




Site Flatness -



局部平整



-



Slip - A defect pattern of small ridges found on the surface of the wafer.



划伤



-


晶圆片表面上的小皱造成的缺陷。




Smudge - A defect or contamination found on the wafer caused by fingerprints.



污迹



-


晶圆片上指纹造成的缺陷或污染。




Sori -



Striation - Defects or contaminations found in the shape of a helix.



条痕



-


螺纹上的缺陷或污染。




Subsite, of a Site - An area found within the site, also rectangular. The center of the subsite must


be located within the original site.



局部子表面



-

局部表面内的区域,也是矩形的。子站中心必须位于原始站点内部。






Surface Texture - Variations found on the real surface of the wafer that deviate from the reference


surface.



表面纹理



-


晶圆片实际面与参考面的差异情况。




Test Wafer - A silicon wafer that is used in manufacturing for monitoring and testing purposes.



测试晶圆片



-


用于生产中监测和测试的晶圆片。




Thickness of Top Silicon Film - The distance found between the face of the top silicon film and


the surface of the oxide layer.



顶部硅膜厚度



-


顶部硅层表面和氧化层表面间的距离。




Top Silicon Film - The layer of silicon on which semiconductor devices are placed. This is located


on top of the insulating layer.



顶部硅膜



-


生产半导体电路的硅层,位于绝缘层顶部。




Total Indicator Reading (TIR) - The smallest distance between planes on the surface of the wafer.



总计指示剂数


(TIR) -


晶圆片表面位面间的最短距离。




Virgin Test Wafer - A wafer that has not been used in manufacturing or other processes.



原始测试晶圆片



-


还没有用于生产或其他流程中的晶圆片。




Void - The lack of any sort of bond (particularly a chemical bond) at the site of bonding.



无效



-


在应该绑定的地方没有绑定(特别是化学绑定)。




Waves - Curves and contours found on the surface of the wafer that can be seen by the naked eye.



波浪



-


晶圆片表面通过肉眼能发现的弯曲和曲线。




Waviness - Widely spaced imperfections on the surface of a wafer.



波纹



-


晶圆片表面经常出现的缺陷。




硅片行业术语大全


(


中英文对照

< p>


A-H)




Acceptor


-


An


element,


such


as


boron,


indium,


and


gallium


used


to


create


a


free


hole


in


a


semiconductor.


The


acceptor


atoms


are


required


to


have


one


less


valence


electron


than


the


semiconductor.



受主



-


一种用来在半导体中形成空穴的元素,比如硼、铟和镓。受主原子必须比半导体元


素少一 价电子




Alignment Precision - Displacement of patterns that occurs during the photolithography process.



套准精度



-


在光刻工艺中转移图形的精度。




Anisotropic - A process of etching that has very little or no undercutting



各向异性



-


在蚀刻过程中,只做少量或不做侧向凹刻。




Area Contamination - Any foreign particles or material that are found on the surface of a wafer.



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