-
硅片行业术语大全
(
中英文对照
I-Z)
Ingot - A cylindrical solid made of
polycrystalline or single crystal silicon from
which wafers are
cut.
晶锭
-
由多晶或单晶形成的圆柱体,晶圆片由此切割而成。
Laser Light-Scattering
Event - A signal pulse that locates surface
imperfections on a wafer.
激光散射
-
由晶圆片表面缺陷引起的脉冲信号。
Lay - The main direction of surface
texture on a wafer.
层
-
晶圆片表面结构的主要方向。
Light Point Defect (LPD) (Not
preferred; see localized light-scatterer)
光点缺陷
(LPD)
(不推荐使用,参见
“
局部光散射
< br>”
)
Lithography - The process used to
transfer patterns onto wafers.
光刻
-
从掩膜到圆片转移的过程。
Localized Light-Scatterer - One feature
on the surface of a wafer, such as a pit or a
scratch that
scatters light. It is also
called a light point defect.
局部光散射
-
晶圆片表面特征,例如小坑或擦伤导致光线散射,也称为光点缺陷。
Lot - Wafers of similar
sizes and characteristics placed together in a
shipment.
批次
-
具有相似尺寸和特性的晶圆片一并放置在一个载片器内。
Majority Carrier - A
carrier, either a hole or an electron that is
dominant in a specific region, such
as
electrons in an N-Type area.
多数载流子
-
一种载流子,在半导体材料中起支配作用的空穴或电子,例如在
N
< br>型中是电
子。
Mechanical Test Wafer - A silicon wafer
used for testing purposes.
机械测试晶圆片
-
用于测试的晶圆片。
Microroughness - Surface roughness with
spacing between the impurities with a measurement
of
less than 100 μm.
微粗糙
-
小于
100
微米的表面粗糙部分。
Miller Indices, of a
Crystallographic Plane - A system that utilizes
three numbers to identify plan
orientation in a crystal.
Miller
索指数
-
三个整数,用于确定某个并行面。这些整数是来自相同系统
的基本向量。
Minimal
Conditions or Dimensions - The allowable
conditions for determining whether or not a
wafer is considered acceptable.
最小条件或方向
-
确定晶圆片是否合格的允许条件。
Minority Carrier - A carrier, either a
hole or an electron that is not dominant in a
specific region,
such as electrons in a P-Type area.
少数载流子
-
在半导体材料中不起支配作用的移动电荷,在
P
型中是电子,在
N
型中是
空
穴。
Mound - A raised defect on the surface
of a wafer measuring more than 0.25 mm.
堆垛
-
晶圆片表面超过
0.25
毫米的缺陷。
Notch - An
indent on the edge of a wafer used for orientation
purposes.
凹槽
-
晶圆片边缘上用于晶向定位的小凹槽。
Orange Peel - A roughened
surface that is visible to the unaided eye.
桔皮
-
可以用肉眼看到的粗糙表面
Orthogonal Misorientation -
直角定向误差
-
Particle - A small piece of
material found on a wafer that is not connected
with it.
颗粒
-
晶圆片上的细小物质。
Particle Counting - Wafers
that are used to test tools for particle
contamination.
颗粒计算
-
用来测试晶圆片颗粒污染的测试工具。
Particulate Contamination -
Particles found on the surface of a wafer. They
appear as bright points
when a
collineated light is shined on the wafer.
颗粒污染
-
晶圆片表面的颗粒。
Pit - A non-removable
imperfection found on the surface of a wafer.
深坑
-
一种晶圆片表面无法消除的缺陷。
Point Defect - A crystal defect that is
an impurity, such as a lattice vacancy or an
interstitial atom.
点缺陷
-
不纯净的晶缺陷,例如格子空缺或原子空隙。
Preferential Etch -
优先蚀刻
-
Premium Wafer
- A wafer that can be used for particle counting,
measuring pattern resolution in
the
photolithography
process,
and
metal
contamination
monitoring.
This
wafer
has
very
strict
specifications for a specific usage,
but looser specifications than the prime wafer.
测试晶圆片
-
影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶
圆片。对于具体
应用该晶圆片有严格的要求,但是要比主晶圆片要求宽松些。
Primary Orientation
Flat - The longest flat found on the wafer.
主定位边
-
晶圆片上最长的定位边。
Process Test Wafer - A
wafer that can be used for processes as well as
area cleanliness.
加工测试晶圆片
-
用于区域清洁过程中的晶圆片。
Profilometer - A tool that is used for
measuring surface topography.
表面形貌剂
-
一种用来测量晶圆片表面形貌的工具。
Resistivity (Electrical) -
The amount of difficulty that charged carriers
have in moving throughout
material.
电阻率(电学方面)
-
材料反抗或对抗电荷在其中通过的一种物理特性。
Required - The minimum
specifications needed by the customer when
ordering wafers.
必需
-
订购晶圆片时客户必须达到的最小规格。
Roughness - The texture found on the
surface of the wafer that is spaced very closely
together.
粗糙度
-
晶圆片表面间隙很小的纹理。
Saw Marks - Surface
irregularities
锯痕
-
表面不规则。
Scan Direction - In the flatness
calculation, the direction of the subsites.
扫描方向
-
平整度测量中,局部平面的方向。
Scanner Site Flatness -
局部平整度扫描仪
-
Scratch - A
mark that is found on the wafer surface.
擦伤
-
晶圆片表面的痕迹。
Secondary Flat - A flat that is smaller
than the primary orientation flat. The position of
this flat
determines what type the
wafer is, and also the orientation of the wafer.
第二定位边
-
比主定位边小的定位边,它的位置决定了晶圆片的类型和晶向。
Shape -
形状
-
Site - An area on the front surface of
the wafer that has sides parallel and
perpendicular to the
primary
orientation flat. (This area is rectangular in
shape)
局部表面
-
晶圆片前面上平行或垂直于主定位边方向的区域。
Site Array - a neighboring
set of sites
局部表面系列
-
一系列的相关局部表面。
Site Flatness -
局部平整
-
Slip - A defect pattern of
small ridges found on the surface of the wafer.
划伤
-
晶圆片表面上的小皱造成的缺陷。
Smudge - A defect or contamination
found on the wafer caused by fingerprints.
污迹
-
晶圆片上指纹造成的缺陷或污染。
Sori -
Striation
- Defects or contaminations found in the shape of
a helix.
条痕
-
螺纹上的缺陷或污染。
Subsite, of a Site - An
area found within the site, also rectangular. The
center of the subsite must
be located
within the original site.
局部子表面
-
局部表面内的区域,也是矩形的。子站中心必须位于原始站点内部。
Surface Texture - Variations found on
the real surface of the wafer that deviate from
the reference
surface.
表面纹理
-
晶圆片实际面与参考面的差异情况。
Test Wafer - A silicon wafer that is
used in manufacturing for monitoring and testing
purposes.
测试晶圆片
-
用于生产中监测和测试的晶圆片。
Thickness of Top Silicon
Film - The distance found between the face of the
top silicon film and
the surface of the
oxide layer.
顶部硅膜厚度
-
顶部硅层表面和氧化层表面间的距离。
Top Silicon Film - The
layer of silicon on which semiconductor devices
are placed. This is located
on top of
the insulating layer.
顶部硅膜
-
生产半导体电路的硅层,位于绝缘层顶部。
Total Indicator Reading
(TIR) - The smallest distance between planes on
the surface of the wafer.
总计指示剂数
(TIR) -
晶圆片表面位面间的最短距离。
Virgin Test Wafer - A wafer that has
not been used in manufacturing or other processes.
原始测试晶圆片
-
还没有用于生产或其他流程中的晶圆片。
Void - The lack of any sort
of bond (particularly a chemical bond) at the site
of bonding.
无效
-
在应该绑定的地方没有绑定(特别是化学绑定)。
Waves - Curves and contours
found on the surface of the wafer that can be seen
by the naked eye.
波浪
-
晶圆片表面通过肉眼能发现的弯曲和曲线。
Waviness - Widely spaced
imperfections on the surface of a wafer.
波纹
-
晶圆片表面经常出现的缺陷。
p>
硅片行业术语大全
(
中英文对照
A-H)
Acceptor
-
An
element,
such
as
boron,
indium,
and
gallium
used
to
create
a
free
hole
in
a
semiconductor.
The
acceptor
atoms
are
required
to
have
one
less
valence
electron
than
the
semiconductor.
受主
-
一种用来在半导体中形成空穴的元素,比如硼、铟和镓。受主原子必须比半导体元
素少一
价电子
Alignment
Precision - Displacement of patterns that occurs
during the photolithography process.
套准精度
-
在光刻工艺中转移图形的精度。
Anisotropic - A process of etching that
has very little or no undercutting
各向异性
-
在蚀刻过程中,只做少量或不做侧向凹刻。
Area Contamination - Any
foreign particles or material that are found on
the surface of a wafer.