-
Temperature
Dependence
of
Si-Based
Thin-
Film
Solar
Cells
Fabricated
on
Amorphous
to
Microcrystalline
Silicon
Transition Phase
Kobsak
SRIPRAPHA Ihsanul
Afdi
YUNAZ Seung
Yeop
MYONG Akira
YAMADA
and
Makoto
KONAGAI
Department
of
Physical
Electronics,
Tokyo
Institute
of
Technology,
2-12-1-S9-9,
O-okayama, Meguro-ku, Tokyo 152-8552,
Japan Quantum Nanoelectronics Research Center,
Tokyo
Institute
of
Technology,
2-12-1-S9-9,
O-okayama,
Meguro-ku,
Tokyo
152-8552,
Japan
(Received June 5, 2007; accepted August
20, 2007; published online November 6, 2007)
The
temperature
dependence
of
silicon
(Si)-based
thin-film
single-junction
solar
cells,
whose intrinsic
absorbers
were fabricated on the transition
phase
between hydrogenated
amorphous silicon (a-Si:H) to
hydrogenated microcrystalline silicon (mc-Si:H),
was
investigated. By varying the
hydrogen dilution ratio, wide
-band-gap
protocrystalline
silicon (pc-Si:H) and
mc-Si:H absorber layers were obtained.
Photo-current
density
–
voltage
(Photo-J
–
V)
characteristics
were
measured
under
AM1.5
illumination at
ambient temperatures in the range of 25
–
75
C. We found
that the solar cells with
pc-Si:H,
which
exists just
below the
a-Si:H to mc-Si:H transition boundary, showed the
lowest
temperature
coefficient (TC) for conversion efficiency and
open-circuit voltage
(Voc),
while the solar cells fabricated at the onset of
the a
-Si:H to mc-Si:H phase
transition exhibited a
relatively high TC for and Voc.
Experimental
results
indicated
that pc-Si:H is a promising
material for the absorber
layer of
the single junction
or
the top cell of tandem solar cells that
operate in high temperature regions.
KEYWORDS: temperature dependence,
amorphous silicon, protocrystalline silicon, Si
thin-film
solar cell, solar cells
1.
Introduction
In general,
the solar cell
performance is measured
under the standard
test
conditions
(STC) of a cell temperature
of 25
摄氏度
and an irradiance
of 100mWcm
2 with AM 1.5
spectral distributions.
However,
in an outdoor
installation,
the operating
temperature
of solar
cells considerably changes depending on
the environment, i.e., the climate
in
the installed a tropical region, the
operating temperature often reaches more
than
70
摄
氏
度
.
The
increase
in
the
operating
temperature
leads
to a decline in
conversion
efficiency
mainly
due
to
the
drop
in
open-circuit
voltage(Voc)
Among
Si-based
solar cells, bulk crystalline Si
solar
cells
which
include
single-crystalline-
Si
(c-Si)
and
polycrystalline-Si
(poly-Si)
solar cells show higher than thin-film
solar cells at room temperature. However,
η
of
c-Siand poly-Si solar cells seriously
decreases with an increase
in the
operating
temperature,
while
hydrogenated amorphous
Si
(a-Si:H)-based thin-film
solar cells
exhibit relatively small variation
in.
The main reason for the
lower
temperature
coefficient
(TC)
of
a-Si:H-based
solar
cells
is
their
wide-band-gap
intrinsic absorber or high
Voc
compared with
those of bulk crystalline
Si-solar cells.
Taking the
real
output power affected
by the operating temperature
and
production cost
into
account,
a-Si:H-based
thin-film
solar
cells
have
advantages
over
bulk
crystalline-Si solar
cells for
use in high
temperature
areas
such as a tropical region.
However,
it
is
well
known
that
a-Si:H-based
thin-film
solar
cells
exhibit
light-induced
degradation
after light
exposure, the so-called
Staebler
–
Wronski effect
(SWE).The SWE in a-Si-based
thin-film solar cells is also a veryim
portant factor that
must
be
considered
for
outdoor
installation.
During
the
past
30
years,
extensive
research
has been conducted to suppress the SWE.
As a result, two kinds of edge materials near
the
phase
boundary
have
been
developed
as
stable
intrinsic
absorbers:
one
is
the
wideband-
gap
protocrystalline
silicon
(pc-Si:H)
existing
just
below
the
a-Si:H-to-microcrystalline
silicon
(mc-Si:H)
transition
transition
and
the
other
is
the
narrow-
band-gap
mc-Si:H with crystalline
silicon volume fraction (Xc) of 30
–
50%
obtained
near the onset of the
phase
transition.
The pc-Si:H
material
nucleate
from the
deposition of the
a-Si:H at just before the transition boundary of
a-Si:H to a-Si:H t
mc-Si:H
mixedphase. Once, the a-Si:H t mc-Si:H
transition is detected,which can be
observed by a real time spectroscopic
ellipsometry (RTSE), the growing material is no
longer
considered
pc-Si:H.
10)
The
unique
properties
of
pc-Si:H
are
the
optical
band
gaps
(Eopt) and the Urbach
tail. The Eopt of pc-Si:H is larger than
conventional material
and increases
with increasing H2 dilution ratio. Besides, the
narrower Urbach tail in
pc-Si:H causes
the higher hole drift mobility than conventional
materials. The key
feature of the pc-
Si:H
material is its relative stability
to light induced degradation as observed in the
electron-mobility lifetime product and
similarly in the solar cell fill factor. These
two kinds of materials are attractive
for application to Si-based thin-film
solar cells because of their low SWE.
Although
the
pc-Si:H
solar
cell
has
shown
a
good
temperature
dependence
among
Si-based
thin-film solar cells,
the behavior of TC for pc-Si:H solar
cells has not yet been
clarified. In
this work, we investigated the
temperature
dependence of a-Si:H-based
solar cells fabricated in the pc-Si:H
to mc-Si:H
transition regime. The TC
values
after
lightinduced
degradation were also investigated in order to
find
the optimal absorber layer for the
use at high operating temperatures.
2.
Experimental
Procedure
The
p
–
i
–
n
single-junction solar cells were fabricated on
Asahi U-type glass
substrates in a
multi chamber system with the structure of
glass/SnO2:F/hydrogenated
p-type
amorphous
silicon
carbide
(p-a-
SiC:H)/buffer/intrinsic
(i-)absorber/n-type
amorphous silicon (n-a-Si:H)/boron-
doped zinc oxide (ZnO:B)/Ag/Al with the cell area
of
0.086 thicknesses of
p, buffer, i-,
and n-layers
were
kept
constant at around
12, 4,
320
–
340, and 2 nm, solar
cells were fabricated at the
substrate
temperature
of
around
200
C
with
deposition
pressures
of
50
–
70
Pa.
Thevery
high frequency (60
MHz) plasma-enhanced chemical vapor deposition
(VHF-PECVD)
was used
to
deposit
the
i-layer.
The
i-layers were
deposited
at different
silane concentrations,
SC ?
SiH4=e SiH4 t
H2T,
by
varying
SC
from 6.0
to
2.4% in
order
to
obtain material with
the phase transition
from
amorphous to microcrystalline a
decrease
in SC,
the deposition rate of the i-layer
declined from 1.6 to 0.9. The doped (p-
and n-layers) and buffer layers were deposited
by a radio-frequency(13.56MHz) PECVD
technique. ZnO was deposited by
metal
organic
chemical vapor deposition
(MOCVD)
as a back reflector,
while Ag
and Al were
evaporated
as back electrodes for all
samples.
The
Raman
spectroscopy
was
performed
using
a
JASCONRS-1000
system
with
a
semiconductor laser at a wavelength of
532 nm.
Ex-situ
spectroscopic ellipsometry
(SE)measurements
(J.
A.
Wollam)
were
used
with
a
variableangle
spectroscopic
ellipsometer. The temperature
dependence of the solar cell parameters were
measured
using a solar simulator in a
chamber at ambient temperatures (T) in the range
of 25
–
75
C with a step increment of 10
C under 1-sun (AM1.5,
100mW
cm
2) irradiation. The
temperature
of
the
sample was
regulated
by
a
temperature-controlled
airflow.
The
temperature dependence of solar
cells
was obtained from
photo-current
density
–
voltage
(photo-J
–
V)
measurements. The value of TC can be expressed as
where Z denotes the solar cell
parameters, i.e.,
η
, Voc,
shortcircuit current density
(Jsc), and
fill factor
(FF). The normalized
temperature Tn
is
chosen to
be
25
C because
it
corresponds
to
the
standard
reference
condition
for
solar
cell
measurement.
The
1-sun
standard light-soaking
test was performed in a climate chamber at the
temperature of
50
C for 100
h.
3.
Results and
Discussion
3.1 Characterization of
intrinsic absorbers
In the first series
of experiments, we inspected the Raman spectra for
the solar cells
fabricated in the phase
transition regime. Figure 1 shows the Raman
spectra for solar
cells prepared with
different SCs which are measured from the nside
(rear-side of the solar cells). The
Raman spectra were deconvoluted to four Gaussian
peaks centered at the Raman shift areas
at around 430, 480, 510, and 520 cm
1,
which
correspond to the longtitude
optical (LO) mode of a-Si:H, the transverse
optical (TO)
mode of a-Si:H, the
defective crystalline phase and
the TO
mode of
c-Si, respectively.
The defective part of the crystalline
phase is included in the
crystalline
fraction.
15)
The Xc
calculated from the Raman spectrum is expressed as
where Ii is the area under the Gaussian
peak centered at the Raman shift of i
cm
1 and
I480
t
I510 t I520 is the total integrated area. By
decreasing
SC from 6.0 to 4.0%, the
peak position of Raman spectra of
a-Si:H in the TO mode increased from the Raman
shift
of 475 to 480 cm
1, as
shown by the solid line in the figure, which means
that the
a-Si:Hmicrostructure improved
when SC decreased, leading to
further
improvement of
stability against
illumination.
16)
For SC
?3:2%, the Raman spectra exhibited
two
peaks
at
480 and
517 cm
1, which correspond to
the onset of mc-Si:H growth. With further
decrease of SC, SC < 3:2%, the peak
position of Raman spectra became that of c-Si in
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