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东京精密株式会社
公司简介
东京精密株式会社是日本著
名半导体制造设备之一
,
公司总部设在日本东京都三
鹰市
,
在美国
,
欧洲
,
新加坡
,
p>
中国等地设有分公司
,
研发基地或生产厂等
.
We
develop our businesses in two key areas:
semiconductor
manufacturing equipment
and precision measuring systems.
Our
philosophy is
to generate long-term
growth through the creation of
beneficial, relationships, with all our
stakeholders - customers, business
partners, shareholders and
employees.
(公司网站原文)
东京精密主要从事半导体加工设备及精密测量仪器制造及开发
.
半导体加工设
备有硅片加工用地倒角机、内圆切片机
,
半导体加工前道工序用的光刻机
(
LEEPL
)、
CMP
、
晶片表面综合检查设备及测试封装用的探针台、划片机、
硅片背面抛光机等
.
过去,东京精密简
称“
TSK
”,在国内半导体行业享有盛誉。现在东京精密
p>
采用了新的商标“
ACCRETECH
”,
她是由英文成长
ACCRETE
和技术
TECHNOLOGY
的合成词,是融合公司”以
WIN-WI
N
精神工作,创世界一流产
品“经营理念的新标志。
参展产品:
硅片材料的内圆切片机、硅片倒角机,光刻机,
CMP
,硅片表
面检查系统,探针台背面减薄抛光机,划片机。
网址:
/
Semiconductor Manufacturing
Equipment:Product list
Wafer
Manufacturing System
Variety of
products line for wafer manufacturers including
Wafer Slicing
Machine and Wafer Edge
Grinding Machine.
Sliced Wafer Carbon
Demounting and Cleaning Machine : C-RW-200/300
Feature 1
Automatic demounting of wafers from the
slicing base, cleaning and storing
into
the cassette.
Wafer Edge Grinding:
W-GM-5200
?
Newly-developed grinding unit enhances
the rotative precision of the
spindle,
and improves the surface roughness.
?
?
The non-contact measuring method
achieves the stable alignment.
Performs
the non-contact measuring of the pre-processed
wafer
thickness at multiple points, the
diameter and notch depth of the
post-
processed wafer.
?
?
The modular
concept to make the optimum process line possible.
Low damage grinding method is
available.
Feature 1
Machine specification ready for 300 mm
and 200 mm wafer.
Feature 2
Visual system (optional) for measuring
the chamfer width of periphery and
notch.
Wafer Edge Grinding:
W-GM-4200
?
Newly-developed grinding unit enhances
the rotative precision of the
spindle,
and improves the surface roughness.
?
?
The non-contact measuring method
achieves the stable alignment.
Performs
the non-contact measuring of the pre-processed
wafer
thickness at multiple points, the
diameter and notch depth of the
post-
processed wafer.
?
?
The modular
concept to make the optimum process line possible.
Low damage grinding method is
available.
Feature 1
Machine specification ready for 75 -
150 mm wafer or for 150 - 200 mm wafer.
Feature 2
Capable
of various material processes, such as chemical
compound
semiconductor.
Wafer Slicing Machine: S-LM-116G
Precise slicing machine for
fragile materials such as glass, ceramics,
ferrite.
Feature 1
16
Feature 2
Open-structure loading unit for easy
mounting of the workpiece.
Feature
3
Easy setting of slicing
speed and wafer thickness with digital switch.
Feature 4
Strong
frame, highly rigid table provides long-term
stability in performance.
Feature
5
Easy coolant adjustment
and dressing operation.
Wafer Slicing
Machine: A-WS-100S
Scribes
wafer substrate with high precision
Feature 1
Easy alignment
With fine adjustment in horizontal and
rotative directions
Feature
2
Easy scribe setting
With
the touch panel to set the index amount, number of
times of scribing, etc.
CMP
CMPs remove unevenness on wafer
surfaces that occur during the production
process. Applications are growing due
to the increase of layers in
semiconductor devices and the growing
variety of wiring materials.
ChaMP: For
300mm Wafers
Combining the technological expertise
built up by Accretech in precision
measuring equipment and semiconductor
manufacturing equipment, we now
offer
with process performance required by
design rules for 90 nm and 32 nm
devices, and able to keep up with the
most advanced volume-production fabs.
Feature 1Air-float Head
?
Reference
polishing is made possible via an air cushion that
provides
uniform pressure distribution.
?
Wafer pressure is applied by an airbag
independent of ring pressure,
providing
excellent low-pressure controllability and
stability.
?
Zone
control is available.
Feature 2Edge Exclusion of 1 mm!
Feature 3Wafer Pressure
Controllability & Repeatability
Feature 4Simple Maintenance for
Polishing Heads - Ring Change
Demounting (approximately 5 seconds)
Slide the snap ring cover
up with both hands
Spread
the snap ring with your thumb (the retaining ring
drops off)
Completely
remove the retaining ring
Mounting
(approximately 10 seconds)
1.
Grip the snap ring with
both hands and push the retainer into the
carrier. Rotate it slightly to align
the faces where the positioning
frame
slips into place.
2.
Attach
the snap ring round the whole circumference and
slide the
cover down.
ChaMP:
For 150 or 200mm Wafers
For
150 or 200mm Wafers
ChaMP: Compact CMP
System
Small
footprint
Wafer Probing
Machines
Wafer probing machines perform
electrical tests of each chip on a wafer,
ensuring the quality of semiconductor
devices.
Wafer Probing Machines:
UF3000EX
Next-generation
high-spec probing machine the world No.1 supplier
presents
Phenomenal levels of
throughput have been made possible with the
synergistic effects of high-speed wafer
handling enabled by a new algorithm,
and the high-speed and low-noise XY
Stage enabled by a newly developed
purpose-built drive unit for probes.
The Z axis ensures world-class load
capacity and high precision, and offers
excellent contact via an optimal
structural design that employs topology
which reliably eliminates changes in
flatness due to positioning.
With advanced OTS latest positioning
system technology and by colorizing
wafer alignment imaging and equipping a
light super magnification function,
the
UF3000EX has improved dramatically in terms of
precision and operability.
Wafer
Probing Machines: UF3000EX-e
Assimilating the up-to-date
technologies such as originative OTS, QPU and
TTG, this super high-spec system
provides the testing system which meets
your needs for the miniaturization of
the next-generation devices and various
testing environment.
Feature
1
OTS - the newest positioning
technology (Optical Target Scope)
OTS enables to measure the relative
position of the cameras with absolute
accuracy, which improved dramatically.
Based on the ACCRETECH
metrology technology, OTS enables the
self-correlation of the alignment
optical system.
Feature 2
QPU
- super high-rigid chucking (Quad-Pod Unit)
To effectively attain the accuracy in
positioning, the high rigidity of every part is
greatly important.
The UF3000 uses the new technology of 4
axes driving mechanism (QPU) for
Z-axis, enabling the high-rigid, stable
probe contact.
Feature
3
Load-port
Testing
environment satisfying the users' needs is
available by the common
platform of
8-inch and 12-inch cassettes and the front
allocation of the
inspection tray. The
machine is also ready for AMHS (Automated Material
Handling System).
Feature 4
TTG
(Touch To Go)
Pursuing the easy
operation, the UF3000 adopts the function to move
to the
position you touch on the map or
image shown on the touch panel. Setting up
is easy, and screen configuration is
possible by the user definition.
Wafer Probing Machine:
UF2000
Tokyo Seimitsu, now
known as Accretech, has continued to lead the
semiconductor industry as the world's
number one manufacturer of wafer
probing machines. The newly developed
UF2000 high-precision 200mm wafer
prober is designed for devices with
decreasing pad pitches typified by LCD
drivers and other such devices, and
features enhanced functionality in all
areas, while offering the same
functions and operating ease as the previous
model.
Feature 1
Achieves overall precision of
±
1.5?
m.
Feature
2
Adopts new processor,
newly designed loader and image processing system
with enhanced performance, dramatically
boosting throughput.
Wafer Probing
Machine: UF200R
Evolving
and Proliferating Wafer Probing Machine, UF Series
Based on a flexible
platform, the high accuracy and high rigidity, UF
series is
further evolved. Wafers are
varying with the progress of line width shrinkage
and assembly technology. This machine
can be used for processing very thin
wafers and can be used as a handler for
the wafer level burn-in system.
Feature 1
8-inch
multipurpose machine.
Wafer
Probing Machine: UF190R
Evolving and Proliferating Wafer
Probing Machine, UF Series
Based on a flexible platform, the high
accuracy and high rigidity, UF series is
further evolved. Wafers are varying
with the progress of line width shrinkage
and assembly technology. This machine
can be used for processing very thin
wafers and can be used as a handler for
the wafer level burn-in system.
Feature 1
High-
performance, high-throughput, and excellent cost
performance machine.
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